(Materials Research Instrument Facility)

The High Resolution X-Ray Laboratory provides analysis of single crystal thin films and layered structures. Presently, quantitative information about film thickness, strain, composition and crystalline quality can be obtained routinely, and more extensive analysis capabilities are being developed. Services can be provided for sample analysis, or for longer term projects, operators can be trained.

Capabilities:

The High Resolution X-Ray Laboratory is equipped with a double crystal diffraction system for measuring X-Ray rocking curves of single crystal epitaxial layers, multiple quantum wells, superlattices or an arbitrary multilayer structure. Layer thickness, layer composition and strain, and layer quality can be determined.

A Rotating Anode X-Ray Generator with 4-circle Diffractometer is also available for the study of thin-film samples. Theta-2 Theta diffraction profiles can be obtained with this system. The measurements are used to determine the crystallinity of the film and its preferential orientation. Computer codes for more quantitative analysis, such as the relative quantity of a given orientation, etc. are presently being developed.

Instrumentation:

1. Enraf Nonius Delft Diffractis 583 X-Ray Generator with 3.5 kW output with normal

or fine focus or 5.5 kW with broad focus. Coupled to a Bede model 6 Diffractometer and a Bede Enhanced Dynamic Range(EDR) Detector .Bede Minicam Interface System(IEEE 488 interface)

2. Rigaku RU-200 Rotating Anode X-Ray Generator with Graphite monochromator;

12 kW output, Point & Line Focus beams, Cu target. Coupled to a Huber 4-Circle Diffractometer(Eulerian Cradle 511.5) and a Bicron NaI Scintilation Detector.

UNDER DEVELOPMENT

Rotating Anode XRG with 4-circle diffractometer, 4-bounce high-resolution monochromator and Single bounce Analyzer (for triple-axis diff., grazing incidence x-ray reflectometry, rocking curve).

This system will be capable of providing detailed information on crystal orientation of epitaxial films, film thickness, composition and strain (triple crystal diffraction) as well as 2D reciprocal space maps of scattered intensity in the plane of diffraction, and interface roughness at the atomic scale(reflectometry).

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