Secondary Ion Mass Spectroscopy (SIMS). An Ar gas ion gun is used to generate a primary ion beam foe SIMS. The ion gun is capable of producing an 3 KeV DC beam that is raster over the sample. Secondary ion fragments are mass separated with a quadrupole mass filter. The instrument is used to take surface mass spectra with an analysis depth of approximately 1 nm. Negative and Positive ions can be analyzed with a usable mass range to 1,000 m/z. Both surface analysis and depth profiles can be performed. A mass resolution of 200 M/DM at 29m/z is attainable for selected samples. Mass spectral data analysis is performed on a PC. The ToF-SIMS can provide the user with basic mass spectral data which can be interpreted for chemical information about constituents in the ppm or ppb range (matric dependant). Surface concentration can be calculated for some samples with sufficient preliminary studies.