X-ray Photoelectron Spectroscopy (XPS) with heatable /coolable sample handling, reaction chamber and Low Energy Ion Scattering capabilities. For the XPS measurements X-rays are generated with Mg and Ti targets. Ejected electrons are analyzed with a hemispherical analyzer capable of a resolution of 0.1 eV. Samples can be analyzed in a range of angles (relative to the analyzer) from 10° to 90° to provide varying degrees of surface sensitivity. Analysis depth of 1 nm to 20 nm are possible, but are samples dependant. Depth profiling is accomplished with a He, Argon, or Neon gas ion gun.

A heatable and coolable sample probe provides a full range of analysis temperatures. This probe is an addition to the Physical Electronics 5300 X-Ray Photoelectron Spectrometer. The temperature controllable probe was designed and purchased from U.H.V. Instruments (Niagara Falls, NY) which is now known as Advanced Plasma Systems (Mississauga, Ontario, Canada). The probe is kept at UHV conditions (10^-9 to 10^-10 torr) to minimize sample contamination from environmental and pump oil contamination and is able to introduce a sample into the analysis chamber at liquid nitrogen temperatures or heated to a temperature of 500°C. Recent additions to the probe have given sample angle capabilities from 10° to 90°relative to the analyzer. Changes in the analysis angle will vary the analysis depth.

Data analysis is performed on a Pentium II 350MHz personal computer which is connected to the instrument with a RBD manufactured interfaced control. The RBD software (AugerScan) can provide the user with basic atomic surface concentrations, chemical information from peaks shifts due to chemical environment, and depth information by angle resolved experiments of ion gun sputtering.